Purpose: creation and continuous maintenance of high-density gas discharge plasma in working spaces of vacuum technological machines. RFPG-250 allows obtaining of ion flux with at least ±2% uniformity on a 200 mm diameter, ion flux density up to 25 mA/cm2)
Installation: into a view port flange or inside the vacuum chamber on a DU60 sliding seal both in new plants and when modernizing the existing ones. There are tested and tried procedures of using plasma generators in the majority of serially produced Russian plants.
Application: processes of ion and plasmachemical etching, depositing of thin film deposition, ion-plasma surface treatment: polishing, nitriding and carbonization. The devices work with any gases that do not cause depositing of low-resistance layers on the protective screen surface. Depositing rate: up to 40 µm/min, capacity: up to 20 kW.
|Operating frequency, MHz||13.56|
|Maximum HF energy input, W||5000|
|Housing diameter, mm||245|
|Operating pressure range, Pa||0.1..10|
|Ion flux density at 1 kW power
a) without accessories
|b) with a specially configured magnetic system||25|