Radio-frequency plasma generator RFPG-250

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Product Description

Purpose: creation and continuous maintenance of high-density gas discharge plasma in working spaces of vacuum technological machines. RFPG-250 allows obtaining of ion flux with at least ±2% uniformity on a 200 mm diameter, ion flux density up to 25 mA/cm2)

Installation: into a view port flange or inside the vacuum chamber on a DU60 sliding seal both in new plants and when modernizing the existing ones. There are tested and tried procedures of using plasma generators in the majority of serially produced Russian plants.

Application: processes of ion and plasmachemical etching, depositing of thin film deposition, ion-plasma surface treatment: polishing, nitriding and carbonization. The devices work with any gases that do not cause depositing of low-resistance layers on the protective screen surface. Depositing rate: up to 40 µm/min, capacity: up to 20 kW.

Parameter RFPG-250
Operating frequency, MHz 13.56
Maximum HF energy input, W 5000
Housing diameter, mm 245
Operating pressure range, Pa 0.1..10
Ion flux density at 1 kW power

a) without accessories

10
b) with a specially configured magnetic system 25

Additional Information

Operating frequency, MHz

13,56

Max Discharge Power, W

1500

Min Discharge Power, W

300

Maximum operating pressure, Pa

10

Minimum operating pressure, Pa

0,1

Maximum discharge voltage, V

4000

Cooling water minimal, l/h

50

ООО “Лаборатория вакуумных технологий”

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