The structure and phase composition of cathode materials of Ti-Si composition, fabricated by sintering a mixture of powders of titanium, silicon, and titanium silicide Ti5Si3 were investigated. It was found that sintering mixtures of Ti + Ti5Si3 allows fabricate high-quality materials with silicon content up to 15 at. % which are sutable for use in the vacuum-arc plasma sources as cathode materials. It was found that in normal mode of the filtered cathodic arc plasma source operation the problems with the stability of the discharge occur, due to the appearance of defects on the surface of the sintered powder Ti-Si cathode. A method of feeding a reaction gas into a vacuum chamber through a plasma source was used that will ensure the stable cathodic arc plasma source operation with the Ti-Si cathodes at the deposition of nitride coatings. The coatings of the Ti-Si-N system were obtained under the conditions of use of high voltage pulsed substrate bias potential. The influence of the process deposition parameters on the composition, structure and properties of the coatings investigated. The conditions were determined which allow synthesize nanostructured coatings with high hardness.