Magnetron-600

Product Description

Purpose: efficient sputtering of targets made of conductive materials by ion bombardment in plasma of an abnormally glowing discharge, metals, alloys and dielectrics depositing in a reactive mode.

Versions: ordinary, ultrafast, with a traveling magnetic system, in a sealed housing, high-frequency.

Processes:

  • Magnetron sputtering of metals and alloys retaining the original composition;
  • thermal evaporation in a magnetron discharge;
  • reactive evaporation of dielectrics.

Installation: on a sliding seal, on a flange, on a Du5 bellows lead.

Additional Information

Max Discharge Power, W

18000

Maximum operating pressure, Pa

10

Minimum operating pressure, Pa

0,07

Maximum cathode length, mm

600

Minimum cathode length, mm

600

Maximum cathode width, mm

80

Minimum cathode width, mm

80

Cathode Thickness, mm

20

Maximum discharge voltage, V

800

Minimum discharge voltage, V

300

ООО “Лаборатория вакуумных технологий”

Reviews

There are no reviews yet, would you like to submit yours?

Be the first to review “Magnetron-600”

Have an Ad? Submit it here!

*

*

*