Purpose: efficient sputtering of targets made of conductive materials by ion bombardment in plasma of an abnormally glowing discharge, metals, alloys and dielectrics depositing in a reactive mode.
Versions: ordinary, ultrafast, with a traveling magnetic system, in a sealed housing, with a built-in lid and drive, high-frequency.
- Magnetron sputtering of metals and alloys retaining the original composition;
- thermal evaporation in a magnetron discharge;
- reactive evaporation of dielectrics.