Circular magnetron D50

Product Description

Purpose: efficient sputtering of targets made of conductive materials by ion bombardment in plasma of an abnormally glowing discharge, metals, alloys and dielectrics depositing in a reactive mode.

Versions: ordinary, ultrafast, with a traveling magnetic system, in a sealed housing, with a built-in lid and drive, high-frequency.

 

Processes:

  • Magnetron sputtering of metals and alloys retaining the original composition;
  • thermal evaporation in a magnetron discharge;
  • reactive evaporation of dielectrics.

Additional Information

Diameter of the magnetron cathode, mm

50, 48

Max Discharge Power, W

1200

Maximum operating pressure, Pa

6

Minimum operating pressure, Pa

0,07

Cathode Thickness, mm

10

Maximum discharge voltage, V

800

Minimum discharge voltage, V

300

Weight, kg

0,8

ООО “Лаборатория вакуумных технологий”

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