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Integral characteristics of the discharge in the inverse magnetron with gas anode, partitioned cathod units and axial plasma flows

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Product Description

The necessity of the use of the controlled method of coatings deposition for realization of principle of con-structing of coatings is shown. A conclusion about perspective of the use for the decision of standing task of plants on the basis of the inversion magnetron sputtering system with a gas anode, partitioned cathode units and axial plasma flows is done. Are presented and analyzed the results of measuring the integral characteristics of the ex-plored sputtering system depending on the pressure of the plasma gas and the magnitude of the magnetic field in the discharge gap. It is shown that the current-voltage characteristics of the explored sputtering system and its change depending on the main parameters affecting its work, similar in nature to other magnetron sputtering systems. Recommendations on the choice of parameters of its work are given.

Additional Information

Authors

Слюсарь Д.В.

Year of publication

2014

2

Volume

109

Language

Russian

Types of files

pdf

Section

Ion Plasma Technologies and Equipment, Plasma Physics

Quality

excellent

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