IBS-52 Circular Ion Beam Source

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Product Description

High density of ion flux in the beam and its small cross dimensions allow to use small-size targets.

Purpose:sputtering of materials from dielectric, semiconductor, magnetic and non-magnetic metal targets.

Processes: deposition of metals and dielectrics by ion sputtering.

Installation: on a sliding seal, on a Du5 bellows lead.

Additional Information

Maximum beam current, A

0,16

Maximum discharge voltage, V

4000

Minimum discharge voltage, V

2500

Emission slit diameter, mm

20

Working Gases

CO2, Nitrogen, Argon, Hydrogen, Oxygen, CxFy, CxHy, He, Ne, Xe

Maximum operating pressure, Pa

10

Minimum operating pressure, Pa

0,001

Type of Magnetic System

Permanent Magnets

Cooling Type

Water-cooled

Weight, kg

0,3

ООО “Лаборатория вакуумных технологий”

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