IBS-400

Product Description

Gas-discharge ion sources generating linear beams. High uniformity of ion flux distribution along the source makes it the optimum choice for substrate treatment on a drum or a carrousel.

Processes:

  • sputtering of materials from dielectric and conductive targets;

  • magnetron sputtering assistance;

  • ion cleaning, etching;

  • polishing;

  • plasma-enhanced chemical vapor deposition (PECVD);

  • surface modification.

Additional Information

Maximum beam current, A

0,65

Linear current density A/m

0,2

Length of ion beam uniform area, mm

375

Maximum average ion energy, eV

2500

Minimum average ion energy, eV

250

Maximum discharge voltage, V

5000

Minimum discharge voltage, V

500

Type of Magnetic System

Permanent Magnets

Working Gases

CO2, Nitrogen, Argon, Hydrogen, Oxygen, CxFy, CxHy, He, Ne, Xe

Maximum operating pressure, Pa

10

Minimum operating pressure, Pa

0,001

Cooling Type

Water-cooled

ООО “Лаборатория вакуумных технологий”

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