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Influence of diffusion barriers on kinetics of solid state amorphization reaction in SC/W/SI/W multilayer coatings

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Product Description

Influence of W-based diffusion barriers on kinet-ics of solid state amorphization reaction in Sc/W/Si/W multilayer coatings has been studied. Growth of the amorphous scandium silicide ScSi as well as growth of the barrier layers due to tungsten-silicon interaction were revealed to occur at the early stage of annealing. As the tungsten silicide formation processes finish the thickness of the barrier layers is stabilized. It leads to the change of parabolic law of amorphous scandium silicide growth by linear one.

Additional Information

Authors

Воронов Д.Л., Зубарев Е.Н., Кондратенко В.В., Пеньков А.В., Першин Ю.П.

Language

Russian

Types of files

pdf

Quality

excellent

Time of event

22-27 апреля 2002 г.

Сonference Title

14-ый Международный симпозиум Тонкие пленки в оптике и электронике

Conference Venue

Ukraine Kharkiv

Conference section

Раздел II Термодинамика образования, фазовые диаграммы

Section

Ion Plasma Technologies and Equipment

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